Intel uses ASML's next-generation equipment to mass-produce notebook chips
ASML revealed on Tuesday, It has been determined to purchase the company's high-end photolithography machines for OEM production of some flagship Panther Lake notebook processors. This move will also help the chip manufacturer become proficient in the use of this equipment. ASML said that Intel has officially launched ASML's new generation high numerical aperture extreme ultraviolet lithography machine (High NA EUV) since it started relevant trials in 2024, using this equipment to engrave circuit patterns for some of its Panther Lake processors. The industry has previously debated when it would be economical to deploy high-NA devices at scale. As chip manufacturing processes continue to shrink to atomic size, all major chip manufacturers will be inseparable from this equipment in the future. A single high-NA lithography machine costs about US$400 million, twice the price of conventional EUV equipment, and the process of introducing this equipment into the production line is extremely difficult. Intel only uses high-NA equipment for specific process layers of the chip, collects data through mass production operations, and works with ASML to continuously optimize equipment performance. Intel did not comment on the news. Panther Lake chips are built using Intel's 18A process and have previously been produced using ASML's conventional EUV lithography machines. The photolithography process uses light beams to draw complex circuit layouts on the wafer, which is the core process of chip manufacturing. Intel has received its first high-NA lithography machine at its Hillsboro R&D base in Oregon in 2024. The base is dedicated to developing new chip manufacturing processes and technologies.